Electron-Beam Writer Raith eLINE Plus

The Raith eLINE Plus enables controlled error- and stitch-free fabrication of nano- and microstructures. Our experimental achieved minimum feature size on SiOx for a thin liftoff metallization process is around 9nm. Unique features of the system are: up to 27 mm variation along the z-coordinate; a 4 inch laser interferometer stage for movement and pattern placement in the nm range; a thermal field emission filament for ultrahigh resolution in all operation modes; tunable electron energy for damage-free imaging; and range of detectors, e.g. Everhart Thornley SE detector, InLens SE detector and angle selective BSE detector.


For more information please contact Stefan Kauschke.

Centre for Advanced Materials
Im Neuenheimer Feld 225
D-69120 Heidelberg

Phone: 06221-54 19 999
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